Titanium dioxide thin films deposited by pulsed vacuum arc

Researcher : Fikri EL GHOULBZOURI

The aim of our project is to correlate the plasma conditions (energy and composition…) to the properties of titanium dioxides (TiO2) thin films (microstructure, composition…) deposited by filtered cathodic arc deposition. The TiO2 thin films have a great potential for technological applications. They crystallize on three different forms; rutile, anatase and brookite. The most stable of them is rutile, and each structure has a particular physical and chemical properties. The synthesis material will be characterized by using different technique such as scanning electron microscopy (SEM), transmission electron microscopy (TEM) and X-ray diffraction. The composition of the films will be determined by Auger electron Spectroscopy. In parallel, our intention will be focused also to the plasma. The mass spectrometer and the optical spectrometer will be used to study the composition and the nature of our plasma. This will permit us, to identify the major parameters which influence the mechanisms of the deposition process and to identify how to elaborate thin films in a controlled way.